Data in support of Impact of precursor dosing on the surface passivation of AZO/AlOx stacks formed using atomic layer deposition
University of Oxford (2025)
Authors:
Yan Wang, Theodore Hobson, Jack Swallow, Shona McNab, John O'Sullivan, Anastasia Soeriyadi, Xinya Niu, Rebekah Fraser, Akash Dasgupta, Soumyajit Maitra, Pietro Altermatt, Robert Weatherup, Matthew Wright, Ruy Bonilla
Abstract:
All data reported in publication: Impact of precursor dosing on the surface passivation of AZO/AlOx stacks formed using atomic layer deposition