de Broglie wave-front engineering

Physical Review A American Physical Society (APS) 62:3 (2000) 033612

Authors:

M Olshanii, N Dekker, C Herzog, M Prentiss

de Broglie wave-front engineering

Physical Review A - Atomic, Molecular, and Optical Physics 62:3 (2000) 033612-033611

Authors:

M Olshanii, N Dekker, C Herzog, M Prentiss

Abstract:

A simple method to create an arbitrary continuous motional state of a free atom starting from a plane wave as an initial condition is presented. The spatial resolution of the method increases with the interaction time with no apparent fundamental limitations. This scheme can be applied in atomic beam experiments.

Guiding neutral atoms on a chip

Physical review letters 84:6 (2000) 1124-1127

Authors:

NH Dekker, CS Lee, V Lorent, JH Thywissen, SP Smith, M Drndic, RM Westervelt, M Prentiss

Abstract:

We demonstrate the guiding of neutral atoms by the magnetic fields due to microfabricated current-carrying wires on a chip. Atoms are guided along a magnetic field minimum parallel to and above the current-carrying wires. Two guide configurations are demonstrated: one using two wires with an external magnetic field, and a second using four wires without an external field. These guide geometries can be extended to integrated atom optics circuits, including beam splitters.

Using neutral atoms and standing light waves to form a calibration artifact for length metrology

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena American Vacuum Society 16:6 (1998) 3841-3845

Authors:

JH Thywissen, KS Johnson, NH Dekker, AP Chu, M Prentiss

Localization of metastable atom beams with optical standing waves: nanolithography at the heisenberg limit

Science (New York, N.Y.) 280:5369 (1998) 1583-1586

Authors:

KS Johnson, JH Thywissen, NH Dekker, KK Berggren, AP Chu, R Younkin, M Prentiss

Abstract:

The spatially dependent de-excitation of a beam of metastable argon atoms, traveling through an optical standing wave, produced a periodic array of localized metastable atoms with position and momentum spreads approaching the limit stated by the Heisenberg uncertainty principle. Silicon and silicon dioxide substrates placed in the path of the atom beam were patterned by the metastable atoms. The de-excitation of metastable atoms upon collision with the surface promoted the deposition of a carbonaceous film from a vapor-phase hydrocarbon precursor. The resulting patterns were imaged both directly and after chemical etching. Thus, quantum-mechanical steady-state atom distributions can be used for sub-0.1-micrometer lithography.