Nynke Dekker: Publications

Guiding Neutral Atoms on a Chip

Physical Review Letters American Physical Society (APS) 84:6 (2000) 1124-1127

Authors:

NH Dekker, CS Lee, V Lorent, JH Thywissen, SP Smith, M Drndić, RM Westervelt, M Prentiss

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Using neutral atoms and standing light waves to form a calibration artifact for length metrology

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena American Vacuum Society 16:6 (1998) 3841-3845

Authors:

JH Thywissen, KS Johnson, NH Dekker, AP Chu, M Prentiss

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Localization of Metastable Atom Beams with Optical Standing Waves: Nanolithography at the Heisenberg Limit

Science American Association for the Advancement of Science (AAAS) 280:5369 (1998) 1583-1586

Authors:

KS Johnson, JH Thywissen, NH Dekker, KK Berggren, AP Chu, R Younkin, M Prentiss

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Metastable-atom-activated growth of an ultrathin carbonaceous resist for reactive ion etching of SiO2 and Si3N4

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena American Vacuum Society 16:3 (1998) 1155-1160

Authors:

JH Thywissen, KS Johnson, NH Dekker, M Prentiss, SS Wong, K Weiss, M Grunze

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Atom lithography using standing-wave quenching

Technical Digest - European Quantum Electronics Conference (1998) 166-167

Authors:

KS Johnson, JH Thywissen, NH Dekker, AP Chu, R Younkin, KK Berggren, M Prentiss

Abstract:

Spatially-dependent optical pumping was used in a standing wave to create nanostructures using metastable argon and resist-based atom lithography. Although the localization is caused by spontaneous emission, the matter wave diffraction and the mechanical effects of the light affect the resulting atomic localization. A study was performed to investigate: the role of the spontaneous emission, including the effect of a non-ideal single-emission quenching probability; transverse and longitudinal velocity spreads in the atomic beam; and the optimization of interaction distance and laser detuning for finite laser power and minimum atomic dosage requirements.

Nynke Dekker

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Guiding Neutral Atoms on a Chip

Authors:

Using neutral atoms and standing light waves to form a calibration artifact for length metrology

Authors:

Localization of Metastable Atom Beams with Optical Standing Waves: Nanolithography at the Heisenberg Limit

Authors:

Metastable-atom-activated growth of an ultrathin carbonaceous resist for reactive ion etching of SiO2 and Si3N4

Authors:

Atom lithography using standing-wave quenching

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Nynke Dekker

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Guiding Neutral Atoms on a Chip

Authors:

Using neutral atoms and standing light waves to form a calibration artifact for length metrology

Authors:

Localization of Metastable Atom Beams with Optical Standing Waves: Nanolithography at the Heisenberg Limit

Authors:

Metastable-atom-activated growth of an ultrathin carbonaceous resist for reactive ion etching of SiO2 and Si3N4

Authors:

Atom lithography using standing-wave quenching

Authors:

Abstract: