Strain in epitaxial MnSi films on Si(111) in the thick film limit studied by polarization-dependent extended x-ray absorption fine structure

(2016)

Authors:

AI Figueroa, SL Zhang, AA Baker, R Chalasani, A Kohn, SC Speller, D Gianolio, C Pfleiderer, G van der Laan, T Hesjedal

Strain in epitaxial MnSi films on Si(111) in the thick film limit studied by polarization-dependent extended x-ray absorption fine structure

Physical Review B - Condensed Matter and Materials Physics American Physical Society (2016)

Authors:

AI Figueroa, SL Zhang, AA Baker, R Chalasani, A Kohn, SC Speller, D Gianolio, C Pfleiderer, G van der Laan, Thorsten Hesjedal

Abstract:

We report a study of the strain state of epitaxial MnSi films on Si(111) substrates in the thick film limit (100-500 A) as a function of film thickness using polarization-dependent extended x-ray absorption fine structure (EXAFS). All films investigated are phase-pure and of high quality with a sharp interface between MnSi and Si. The investigated MnSi films are in a thickness regime where the magnetic transition temperature Tc assumes a thickness-independent enhanced value of ≥43 K as compared with that of bulk MnSi, where Tc ≈ 29 K. A detailed refinement of the EXAFS data reveals that the Mn positions are unchanged, whereas the Si positions vary along the out-of-plane [111]-direction, alternating in orientation from unit cell to unit cell. Thus, for thick MnSi films, the unit cell volume is essentially that of bulk MnSi — except in the vicinity of the interface with the Si substrate (thin film limit). In view of the enhanced magnetic transition temperature we conclude that the mere presence of the interface, and its specific characteristics, strongly affects the magnetic properties of the entire MnSi film, even far from the interface. Our analysis provides invaluable information about the local strain at the MnSi/Si(111) interface. The presented methodology of polarization dependent EXAFS can also be employed to investigate the local structure of other interesting interfaces.

Imaging and manipulation of skyrmion lattice domains in Cu2OSeO3

Applied Physics Letters American Institute of Physics 109 (2016) 192406

Authors:

Shilei Zhang, Andreas Bauer, Helmuth Berger, Christian Pfleiderer, Gerrit van der Laan, Thorsten Hesjedal

Abstract:

Nanoscale chiral skyrmions in noncentrosymmetric helimagnets are promising binary state variables in highdensity, low-energy nonvolatile memory. Nevertheless, they normally appear in an ordered, single-domain lattice phase, which makes it difficult to write information unless they are spatially broken up into smaller units, each representing a bit. Thus, the formation and manipulation of skyrmion lattice domains is a prerequisite for memory applications. Here, using an imaging technique based on resonant magnetic x-ray diffraction, we demonstrate the mapping and manipulation of skyrmion lattice domains in Cu2OSeO3. The material is particularly interesting for applications owing to its insulating nature, allowing for electric fielddriven domain manipulation.

Step-flow growth of Bi2Te3 nanobelts

Crystal Growth and Design American Chemical Society 16:12 (2016) 6961-6966

Authors:

Piet Schoenherr, Thomas Tilbury, Haobei Wang, Amir A Haghighirad, V Srot, P van Aken, Thorsten Hesjedal

Abstract:

Understanding the growth mechanism of nanostructures is key to tailoring their properties. Many compounds form nanowires following the vapor-liquid-solid (VLS) growth mechanism, and the growth of Bi2Te3 nanobelts was also explained following the VLS route. Here, we present another growth mechanism of Bi2Te3 nano- and sub-micron belts and ribbons. The samples were grown by physical vapor transport from Bi2Te3 precursor using TiO2 nanoparticles as catalyst, and analyzed by scanning electron microscopy and scanning transmission electron microscopy. The growth starts from a Te-rich cluster, and proceeds via a thin, tip-catalyzed primary layer growing in the [110] direction. The primary layer serves as a support for subsequent step-flow growth. The precursor predominantly absorbs on the substrate and reaches the belt by migration from the base to the tip. Terrace edges pose energy barriers that enhance the growth rate of secondary layers compared to the primary layer. Broadening of the sidewalls is commonly observed and leads to triangular voids that can even result in a branching of the growing belts. Step-flow growth of Bi2Te3 sub-micron belts is different from the spiral-like growth mode of Bi2Te3 thin films, and an important step towards the growth of layered topological insulator nanostructures.

Spin pumping in magnetic trilayer structures with an MgO barrier

Scientific Reports Nature Publishing Group 6 (2016) 35582

Authors:

Alexander A Baker, AI Figueroa, D Pingstone, VK Lazarov, G van der Laan, Thorsten Hesjedal

Abstract:

We present a study of the interaction mechanisms in magnetic trilayer structures with an MgO barrier grown by molecular beam epitaxy. The interlayer exchange coupling, Aex, is determined using SQUID magnetometry and ferromagnetic resonance (FMR), displaying an unexpected oscillatory behaviour as the thickness, tMgO, is increased from 1 to 4 nm. Transmission electron microscopy confirms the continuity and quality of the tunnelling barrier, eliminating the prospect of exchange arising from direct contact between the two ferromagnetic layers. The Gilbert damping is found to be almost independent of the MgO thickness, suggesting the suppression of spin pumping. The element-specific technique of x-ray detected FMR reveals a small dynamic exchange interaction, acting in concert with the static interaction to induce coupled precession across the multilayer stack. These results highlight the potential of spin pumping and spin transfer torque for device applications in magnetic tunnel junctions relying on commonly used MgO barriers.