The cleanroom facility at the Department of Physics provides a high-class cleanroom environment for micro and nanofabrication processes. Researchers can access dedicated Class 1000 and Class 100 areas and the following equipment for sample preparation and lithographic processing:
- Dedicated laminar flow benches for wet chemical processing and etching
- Programmable spin coaters and hotplates for resist processing
- Double-sided mask alignment for UV photolithography
- Sputter coating and thermal evaporation for thin-film deposition
- Oxygen plasma barrel etching
- Megasonic wafer cleaning
- Substrate bonding with wafer alignment
- Electron beam lithography
We provide training for researchers to use our equipment and we welcome enquiries from across the University of Oxford and beyond, including from commercial and industrial users.