The cleanroom facility at the Department of Physics provides a high-class cleanroom environment for micro and nanofabrication processes. Researchers can access dedicated Class 1000 and Class 100 areas and the following equipment for sample preparation and lithographic processing:

  • Dedicated laminar flow benches for wet chemical processing and etching
  • Programmable spin coaters and hotplates for resist processing
  • Double-sided mask alignment for UV photolithography
  • Sputter coating and thermal evaporation for thin-film deposition
  • Oxygen plasma barrel etching
  • Megasonic wafer cleaning
  • Substrate bonding with wafer alignment
  • Electron beam lithography

We provide training for researchers to use our equipment and we welcome enquiries from across the University of Oxford and beyond, including from commercial and industrial users.


Facility Manager

+44 (0) 1865 272392