We provide researchers and external customers with access to cleanroom facilities for micro- and nanofabrication and scanning electron microscopy. The core of the facility is a Class 100 and Class 1000 cleanroom suite for sample preparation and lithography, including equipment for resist processing, thin-film deposition, and etching. Additional capabilities include electron beam lithography (EBL) for nanoscale lithographic tasks and focused ion beam (FIB) for small-scale micro- and nano-patterning or materials characterisation, including 3D sub-surface analysis.
Scanning electron microscopy facilities are available for high-resolution imaging, metrology, and elemental analysis with energy dispersive X-ray spectroscopy (EDS/EDX).
We provide training for researchers to use our equipment and we welcome enquiries from across the University of Oxford and beyond, including from commercial and industrial users.