Magnetization reversal processes in epitaxial Co/Fe bi-layers grown on MgO(001)
Journal of Applied Physics 103:6 (2008)
Abstract:
We report on the mechanism of magnetization reversal in epitaxial Co/Fe bi-layers grown by molecular beam epitaxy on MgO(001) substrates. For Co films thicker than 5 nm, the crystal structure is hexagonal. The Fe layer follows an epitaxial relation relative to the MgO substrate of (001) [100] Fe// (001) [110] MgO. When deposited on a cubic Fe layer, the Co layer follows a bi-crystal epitaxial relation of (11 2- 0) [0001] Co// (001) 〈 100 〉 Fe as previously reported [Popova, Appl. Phys. Lett. 81, 1035 (2002); Wang, J. Appl. Phys. 101, 09D103 (2007)]. The magnetization reversal in-plane follows a cubic fourfold symmetry, which coincides with that of the underlying bcc Fe layer. In this study, we find that the area of each Co crystal domain spans 200-1500 nm2 and that these two domains are approximately evenly distributed. The micromagnetic reversal mechanism is a combination of coherent rotational processes and domain wall displacement. These magnetic domains are sized tens of μm and separated by predominately 90° or occasionally 180° domain walls along the Fe 〈 110 〉 and Fe 〈 100 〉 directions, respectively. The cubic anisotropy of the bi-crystalline Co layer is explained by exchange-coupling between hcp grains with perpendicular crystallographic orientation, each having in-plane uniaxial magnetic anisotropy along its respective [0001] direction. © 2008 American Institute of Physics.Rapid fabrication of nanoneedle arrays by ion sputtering
Nanotechnology 19:1 (2008)
Abstract:
We report a novel method for rapidly fabricating ordered nanoneedles using an ion beam that cuts through the Fe/GaAs single thin layer or the Fe/MgO/Fe/GaAs multilayer producing a pillar pattern followed by raster-scanning normal to the patterned area. However, such ordered nanoneedles were not formed on the pure GaAs substrate surface without the thin Fe film coating, nor were nanoneedles formed on the GaAs substrate coated with a thin Cr epitaxial film, when this method was used. It has advantages over other methods, being simple, fast and well controlled for fabricating one-dimensional nanostructure arrays, leading to a range of applications such as high aspect ratio sharp tips for atomic force microscope/atom probes and consequent possible quantum confinement effects or arrays of nanostructures for field-optical/photoluminescence emission and data recording. © IOP Publishing Ltd.Rapid fabrication of nanoneedle arrays by ion sputtering.
Nanotechnology 19:1 (2008) 015303
Abstract:
We report a novel method for rapidly fabricating ordered nanoneedles using an ion beam that cuts through the Fe/GaAs single thin layer or the Fe/MgO/Fe/GaAs multilayer producing a pillar pattern followed by raster-scanning normal to the patterned area. However, such ordered nanoneedles were not formed on the pure GaAs substrate surface without the thin Fe film coating, nor were nanoneedles formed on the GaAs substrate coated with a thin Cr epitaxial film, when this method was used. It has advantages over other methods, being simple, fast and well controlled for fabricating one-dimensional nanostructure arrays, leading to a range of applications such as high aspect ratio sharp tips for atomic force microscope/atom probes and consequent possible quantum confinement effects or arrays of nanostructures for field-optical/photoluminescence emission and data recording.A study of uranium-based multilayers: II. Magnetic properties
JOURNAL OF PHYSICS-CONDENSED MATTER 20:21 (2008) ARTN 215230
A study of uranium-based multilayers: I. Fabrication and structural characterization
JOURNAL OF PHYSICS-CONDENSED MATTER 20:21 (2008) ARTN 215229