The single-step synthesis of a DNA tetrahedron.

Chem Commun (Camb) (2004) 1372-1373

Authors:

Russell P Goodman, Richard M Berry, Andrew J Turberfield

Abstract:

A tetrahedral nanostructure whose edges are DNA double helices self-assembles spontaneously when four appropriately designed oligonucleotides are annealed together in solution; the ease of synthesis, rigidity, and adaptability of this construct make it a promising candidate as a cage for other large molecules and as a building block for more complicated nanostructures.

DNA scaffolds and electron crystallography: a method for protein structure determination

BIOPHYS J 86:1 (2004) 80A-80A

Authors:

J Malo, JC Mitchell, C Venien-Bryan, JR Harris, LN Johnson, DJ Sherratt, AJ Turberfield

Self assembled DNA monolayers as a mechanism for redox probe control

BIOPHYS J 86:1 (2004) 596A-596A

Authors:

RP Goodman, JJ Davis, AJ Turberfield

Holographic photonic crystals with diamond symmetry

Physical Review B - Condensed Matter and Materials Physics 68:20 (2003)

Authors:

DN Sharp, AJ Turberfield, RG Denning

Abstract:

We explore the analytical design of high-symmetry photonic crystals made by holographic lithography. We show how holographic lithography may be used to produce diamond-like photonic crystals that have a full, three-dimensional photonic band gap at a refractive index contrast equal to the lowest yet published. © 2003 The American Physical Society.

Sol-gel organic-inorganic composites for 3-D holographic lithography of photonic crystals with submicron periodicity

Chemistry of Materials 15:12 (2003) 2301-2304

Authors:

K Saravanamuttu, CF Blanford, DN Sharp, ER Dedman, AJ Turberfield, RG Denning

Abstract:

We demonstrate that silica-acrylate materials doped with transition metal (Zr, Ti) oxide nanoparticles are suitable for the three-dimensional holographic lithography of photonic crystals with submicron periodicity and large inorganic contents. By careful choice of inorganic components, such composites could provide a route to the template-free, direct lithography of three-dimensionally ordered structures with high refractive-index contrast, submicron periodicity, and band gaps in the visible and infrared regions.